Power Density after Voltage Scaling VLSI Solution

STEP 0: Pre-Calculation Summary
Formula Used
Power Density after Voltage Scaling = Power Density MOSFET*(Scaling Factor)^3
PD' = PD*(Sf)^3
This formula uses 3 Variables
Variables Used
Power Density after Voltage Scaling - Power Density after Voltage Scaling is defined as a measure of power output per unit Area. It quantifies power distribution within a given space when MOSFET is scaled down by voltage scaling method.
Power Density MOSFET - Power Density MOSFET is defined as a measure of power output per unit Area. It quantifies how much power is distributed within a given space.
Scaling Factor - Scaling factor is defined as the ratio by which the dimensions of the transistor are changed during the design process.
STEP 1: Convert Input(s) to Base Unit
Power Density MOSFET: 20 --> No Conversion Required
Scaling Factor: 1.5 --> No Conversion Required
STEP 2: Evaluate Formula
Substituting Input Values in Formula
PD' = PD*(Sf)^3 --> 20*(1.5)^3
Evaluating ... ...
PD' = 67.5
STEP 3: Convert Result to Output's Unit
67.5 --> No Conversion Required
FINAL ANSWER
67.5 <-- Power Density after Voltage Scaling
(Calculation completed in 00.004 seconds)

Credits

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Created by Priyanka Patel
Lalbhai Dalpatbhai College of engineering (LDCE), Ahmedabad
Priyanka Patel has created this Calculator and 25+ more calculators!
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Verified by Santhosh Yadav
Dayananda Sagar College Of Engineering (DSCE), Banglore
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25 VLSI Material Optimization Calculators

Bulk Depletion Region Charge Density VLSI
​ Go Bulk Depletion Region Charge Density = -(1-((Lateral Extent of Depletion Region with Source+Lateral Extent of Depletion Region with Drain)/(2*Channel Length)))*sqrt(2*[Charge-e]*[Permitivity-silicon]*[Permitivity-vacuum]*Acceptor Concentration*abs(2*Surface Potential))
Body Effect Coefficient
​ Go Body Effect Coefficient = modulus((Threshold Voltage-Threshold Voltage DIBL)/(sqrt(Surface Potential+(Source Body Potential Difference))-sqrt(Surface Potential)))
Junction Built-in Voltage VLSI
​ Go Junction Built-in Voltage = ([BoltZ]*Temperature/[Charge-e])*ln(Acceptor Concentration*Donor concentration/(Intrinsic Concentration)^2)
PN Junction Depletion Depth with Source VLSI
​ Go P-n Junction Depletion Depth with Source = sqrt((2*[Permitivity-silicon]*[Permitivity-vacuum]*Junction Built-in Voltage)/([Charge-e]*Acceptor Concentration))
Total Source Parasitic Capacitance
​ Go Source Parasitic Capacitance = (Capacitance between Junction of Body and Source*Area of Source Diffusion)+(Capacitance between Junction of Body and Side wall*Sidewall Perimeter of Source Diffusion)
Short Channel Saturation Current VLSI
​ Go Short Channel Saturation Current = Channel Width*Saturation Electron Drift Velocity*Oxide Capacitance per Unit Area*Saturation Drain Source Voltage
Junction Current
​ Go Junction Current = (Static Power/Base Collector Voltage)-(Sub Threshold Current+Contention Current+Gate Current)
Surface Potential
​ Go Surface Potential = 2*Source Body Potential Difference*ln(Acceptor Concentration/Intrinsic Concentration)
DIBL Coefficient
​ Go DIBL Coefficient = (Threshold Voltage DIBL-Threshold Voltage)/Drain to Source Potential
Threshold Voltage when Source is at Body Potential
​ Go Threshold Voltage DIBL = DIBL Coefficient*Drain to Source Potential+Threshold Voltage
Subthreshold Slope
​ Go Sub Threshold Slope = Source Body Potential Difference*DIBL Coefficient*ln(10)
Threshold Voltage
​ Go Threshold Voltage = Gate to Channel Voltage-(Channel Charge/Gate Capacitance)
Gate Capacitance
​ Go Gate Capacitance = Channel Charge/(Gate to Channel Voltage-Threshold Voltage)
Channel Charge
​ Go Channel Charge = Gate Capacitance*(Gate to Channel Voltage-Threshold Voltage)
Gate Length using Gate Oxide Capacitance
​ Go Gate Length = Gate Capacitance/(Capacitance of Gate Oxide Layer*Gate Width)
Gate Oxide Capacitance
​ Go Capacitance of Gate Oxide Layer = Gate Capacitance/(Gate Width*Gate Length)
Oxide Capacitance after Full Scaling VLSI
​ Go Oxide Capacitance after Full Scaling = Oxide Capacitance per Unit Area*Scaling Factor
Critical Voltage
​ Go Critical Voltage = Critical Electric Field*Electric Field Across Channel Length
Gate Oxide Thickness after Full Scaling VLSI
​ Go Gate Oxide Thickness after Full Scaling = Gate Oxide Thickness/Scaling Factor
Intrinsic Gate Capacitance
​ Go MOS Gate Overlap Capacitance = MOS Gate Capacitance*Transition Width
Channel Length after Full Scaling VLSI
​ Go Channel Length after Full Scaling = Channel Length/Scaling Factor
Junction Depth after Full Scaling VLSI
​ Go Junction Depth after Full Scaling = Junction Depth/Scaling Factor
Channel Width after Full Scaling VLSI
​ Go Channel Width after Full Scaling = Channel Width/Scaling Factor
Mobility in Mosfet
​ Go Mobility in MOSFET = K Prime/Capacitance of Gate Oxide Layer
K-Prime
​ Go K Prime = Mobility in MOSFET*Capacitance of Gate Oxide Layer

Power Density after Voltage Scaling VLSI Formula

Power Density after Voltage Scaling = Power Density MOSFET*(Scaling Factor)^3
PD' = PD*(Sf)^3

What are the impacts of constant-voltage scaling?

Constant-voltage scaling increases the drain current density and the power density by a factor of S3. This large increase in current and power densities may eventually cause serious reliability problems for the scaled transistor, such as electromigration, hot-carrier degradation, oxide breakdown, and electrical over-stress.

How to Calculate Power Density after Voltage Scaling VLSI?

Power Density after Voltage Scaling VLSI calculator uses Power Density after Voltage Scaling = Power Density MOSFET*(Scaling Factor)^3 to calculate the Power Density after Voltage Scaling, The Power Density after Voltage Scaling VLSI formula is defined as a measure of power output per unit Area. It quantifies power distribution within a given space when MOSFET is scaled down by voltage scaling method. Power Density after Voltage Scaling is denoted by PD' symbol.

How to calculate Power Density after Voltage Scaling VLSI using this online calculator? To use this online calculator for Power Density after Voltage Scaling VLSI, enter Power Density MOSFET (PD) & Scaling Factor (Sf) and hit the calculate button. Here is how the Power Density after Voltage Scaling VLSI calculation can be explained with given input values -> 67.5 = 20*(1.5)^3.

FAQ

What is Power Density after Voltage Scaling VLSI?
The Power Density after Voltage Scaling VLSI formula is defined as a measure of power output per unit Area. It quantifies power distribution within a given space when MOSFET is scaled down by voltage scaling method and is represented as PD' = PD*(Sf)^3 or Power Density after Voltage Scaling = Power Density MOSFET*(Scaling Factor)^3. Power Density MOSFET is defined as a measure of power output per unit Area. It quantifies how much power is distributed within a given space & Scaling factor is defined as the ratio by which the dimensions of the transistor are changed during the design process.
How to calculate Power Density after Voltage Scaling VLSI?
The Power Density after Voltage Scaling VLSI formula is defined as a measure of power output per unit Area. It quantifies power distribution within a given space when MOSFET is scaled down by voltage scaling method is calculated using Power Density after Voltage Scaling = Power Density MOSFET*(Scaling Factor)^3. To calculate Power Density after Voltage Scaling VLSI, you need Power Density MOSFET (PD) & Scaling Factor (Sf). With our tool, you need to enter the respective value for Power Density MOSFET & Scaling Factor and hit the calculate button. You can also select the units (if any) for Input(s) and the Output as well.
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