Junction Built-in Voltage VLSI Solution

STEP 0: Pre-Calculation Summary
Formula Used
Junction Built-in Voltage = ([BoltZ]*Temperature/[Charge-e])*ln(Acceptor Concentration*Donor concentration/(Intrinsic Concentration)^2)
Ø0 = ([BoltZ]*T/[Charge-e])*ln(NA*ND/(Ni)^2)
This formula uses 2 Constants, 1 Functions, 5 Variables
Constants Used
[Charge-e] - Charge of electron Value Taken As 1.60217662E-19
[BoltZ] - Boltzmann constant Value Taken As 1.38064852E-23
Functions Used
ln - The natural logarithm, also known as the logarithm to the base e, is the inverse function of the natural exponential function., ln(Number)
Variables Used
Junction Built-in Voltage - (Measured in Volt) - Junction Built-in Voltage is defined as the voltage that exists across a semiconductor junction in thermal equilibrium, where no external voltage is applied.
Temperature - (Measured in Kelvin) - Temperature reflects how hot or cold an object or environment is.
Acceptor Concentration - (Measured in 1 per Cubic Meter) - Acceptor Concentration refers to the concentration of acceptor dopant atoms in a semiconductor material.
Donor concentration - (Measured in 1 per Cubic Meter) - Donor concentration refers to the concentration of donor dopant atoms introduced into a semiconductor material to increase the number of free electrons.
Intrinsic Concentration - (Measured in 1 per Cubic Meter) - Intrinsic Concentration refers to the concentration of charge carriers (electrons and holes) in an intrinsic semiconductor at thermal equilibrium.
STEP 1: Convert Input(s) to Base Unit
Temperature: 300 Kelvin --> 300 Kelvin No Conversion Required
Acceptor Concentration: 1E+16 1 per Cubic Centimeter --> 1E+22 1 per Cubic Meter (Check conversion ​here)
Donor concentration: 1E+17 1 per Cubic Centimeter --> 1E+23 1 per Cubic Meter (Check conversion ​here)
Intrinsic Concentration: 14500000000 1 per Cubic Centimeter --> 1.45E+16 1 per Cubic Meter (Check conversion ​here)
STEP 2: Evaluate Formula
Substituting Input Values in Formula
Ø0 = ([BoltZ]*T/[Charge-e])*ln(NA*ND/(Ni)^2) --> ([BoltZ]*300/[Charge-e])*ln(1E+22*1E+23/(1.45E+16)^2)
Evaluating ... ...
Ø0 = 0.75463200359389
STEP 3: Convert Result to Output's Unit
0.75463200359389 Volt --> No Conversion Required
FINAL ANSWER
0.75463200359389 0.754632 Volt <-- Junction Built-in Voltage
(Calculation completed in 00.004 seconds)

Credits

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Created by Priyanka Patel
Lalbhai Dalpatbhai College of engineering (LDCE), Ahmedabad
Priyanka Patel has created this Calculator and 25+ more calculators!
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Verified by Santhosh Yadav
Dayananda Sagar College Of Engineering (DSCE), Banglore
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25 VLSI Material Optimization Calculators

Bulk Depletion Region Charge Density VLSI
​ Go Bulk Depletion Region Charge Density = -(1-((Lateral Extent of Depletion Region with Source+Lateral Extent of Depletion Region with Drain)/(2*Channel Length)))*sqrt(2*[Charge-e]*[Permitivity-silicon]*[Permitivity-vacuum]*Acceptor Concentration*abs(2*Surface Potential))
Body Effect Coefficient
​ Go Body Effect Coefficient = modulus((Threshold Voltage-Threshold Voltage DIBL)/(sqrt(Surface Potential+(Source Body Potential Difference))-sqrt(Surface Potential)))
Junction Built-in Voltage VLSI
​ Go Junction Built-in Voltage = ([BoltZ]*Temperature/[Charge-e])*ln(Acceptor Concentration*Donor concentration/(Intrinsic Concentration)^2)
PN Junction Depletion Depth with Source VLSI
​ Go P-n Junction Depletion Depth with Source = sqrt((2*[Permitivity-silicon]*[Permitivity-vacuum]*Junction Built-in Voltage)/([Charge-e]*Acceptor Concentration))
Total Source Parasitic Capacitance
​ Go Source Parasitic Capacitance = (Capacitance between Junction of Body and Source*Area of Source Diffusion)+(Capacitance between Junction of Body and Side wall*Sidewall Perimeter of Source Diffusion)
Short Channel Saturation Current VLSI
​ Go Short Channel Saturation Current = Channel Width*Saturation Electron Drift Velocity*Oxide Capacitance per Unit Area*Saturation Drain Source Voltage
Junction Current
​ Go Junction Current = (Static Power/Base Collector Voltage)-(Sub Threshold Current+Contention Current+Gate Current)
Surface Potential
​ Go Surface Potential = 2*Source Body Potential Difference*ln(Acceptor Concentration/Intrinsic Concentration)
DIBL Coefficient
​ Go DIBL Coefficient = (Threshold Voltage DIBL-Threshold Voltage)/Drain to Source Potential
Threshold Voltage when Source is at Body Potential
​ Go Threshold Voltage DIBL = DIBL Coefficient*Drain to Source Potential+Threshold Voltage
Subthreshold Slope
​ Go Sub Threshold Slope = Source Body Potential Difference*DIBL Coefficient*ln(10)
Threshold Voltage
​ Go Threshold Voltage = Gate to Channel Voltage-(Channel Charge/Gate Capacitance)
Gate Capacitance
​ Go Gate Capacitance = Channel Charge/(Gate to Channel Voltage-Threshold Voltage)
Channel Charge
​ Go Channel Charge = Gate Capacitance*(Gate to Channel Voltage-Threshold Voltage)
Gate Length using Gate Oxide Capacitance
​ Go Gate Length = Gate Capacitance/(Capacitance of Gate Oxide Layer*Gate Width)
Gate Oxide Capacitance
​ Go Capacitance of Gate Oxide Layer = Gate Capacitance/(Gate Width*Gate Length)
Oxide Capacitance after Full Scaling VLSI
​ Go Oxide Capacitance after Full Scaling = Oxide Capacitance per Unit Area*Scaling Factor
Critical Voltage
​ Go Critical Voltage = Critical Electric Field*Electric Field Across Channel Length
Gate Oxide Thickness after Full Scaling VLSI
​ Go Gate Oxide Thickness after Full Scaling = Gate Oxide Thickness/Scaling Factor
Intrinsic Gate Capacitance
​ Go MOS Gate Overlap Capacitance = MOS Gate Capacitance*Transition Width
Channel Length after Full Scaling VLSI
​ Go Channel Length after Full Scaling = Channel Length/Scaling Factor
Junction Depth after Full Scaling VLSI
​ Go Junction Depth after Full Scaling = Junction Depth/Scaling Factor
Channel Width after Full Scaling VLSI
​ Go Channel Width after Full Scaling = Channel Width/Scaling Factor
Mobility in Mosfet
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K-Prime
​ Go K Prime = Mobility in MOSFET*Capacitance of Gate Oxide Layer

Junction Built-in Voltage VLSI Formula

Junction Built-in Voltage = ([BoltZ]*Temperature/[Charge-e])*ln(Acceptor Concentration*Donor concentration/(Intrinsic Concentration)^2)
Ø0 = ([BoltZ]*T/[Charge-e])*ln(NA*ND/(Ni)^2)

How is the Junction Built-In Voltage created in a semiconductor device used in VLSI?

The Junction Built-In Voltage is created by the diffusion of charge carriers across a semiconductor junction, such as a p-n junction, resulting in a potential difference due to the difference in concentration of carriers on either side of the junction. This voltage is established at thermal equilibrium.

How to Calculate Junction Built-in Voltage VLSI?

Junction Built-in Voltage VLSI calculator uses Junction Built-in Voltage = ([BoltZ]*Temperature/[Charge-e])*ln(Acceptor Concentration*Donor concentration/(Intrinsic Concentration)^2) to calculate the Junction Built-in Voltage, The Junction Built-in Voltage VLSI formula is defined as the voltage that exists across a semiconductor junction in thermal equilibrium, where no external voltage is applied. Junction Built-in Voltage is denoted by Ø0 symbol.

How to calculate Junction Built-in Voltage VLSI using this online calculator? To use this online calculator for Junction Built-in Voltage VLSI, enter Temperature (T), Acceptor Concentration (NA), Donor concentration (ND) & Intrinsic Concentration (Ni) and hit the calculate button. Here is how the Junction Built-in Voltage VLSI calculation can be explained with given input values -> 0.754632 = ([BoltZ]*300/[Charge-e])*ln(1E+22*1E+23/(1.45E+16)^2).

FAQ

What is Junction Built-in Voltage VLSI?
The Junction Built-in Voltage VLSI formula is defined as the voltage that exists across a semiconductor junction in thermal equilibrium, where no external voltage is applied and is represented as Ø0 = ([BoltZ]*T/[Charge-e])*ln(NA*ND/(Ni)^2) or Junction Built-in Voltage = ([BoltZ]*Temperature/[Charge-e])*ln(Acceptor Concentration*Donor concentration/(Intrinsic Concentration)^2). Temperature reflects how hot or cold an object or environment is, Acceptor Concentration refers to the concentration of acceptor dopant atoms in a semiconductor material, Donor concentration refers to the concentration of donor dopant atoms introduced into a semiconductor material to increase the number of free electrons & Intrinsic Concentration refers to the concentration of charge carriers (electrons and holes) in an intrinsic semiconductor at thermal equilibrium.
How to calculate Junction Built-in Voltage VLSI?
The Junction Built-in Voltage VLSI formula is defined as the voltage that exists across a semiconductor junction in thermal equilibrium, where no external voltage is applied is calculated using Junction Built-in Voltage = ([BoltZ]*Temperature/[Charge-e])*ln(Acceptor Concentration*Donor concentration/(Intrinsic Concentration)^2). To calculate Junction Built-in Voltage VLSI, you need Temperature (T), Acceptor Concentration (NA), Donor concentration (ND) & Intrinsic Concentration (Ni). With our tool, you need to enter the respective value for Temperature, Acceptor Concentration, Donor concentration & Intrinsic Concentration and hit the calculate button. You can also select the units (if any) for Input(s) and the Output as well.
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