Emitter Injection Efficiency given Doping Constants Solution

STEP 0: Pre-Calculation Summary
Formula Used
Emmitter Injection Efficiency = Doping on N-side/(Doping on N-side+Doping on P-side)
γ = Ndn/(Ndn+Ndp)
This formula uses 3 Variables
Variables Used
Emmitter Injection Efficiency - Emmitter Injection Efficiency is the ratio of the electron current flowing in the emitter to the total current across the emitter base junction.
Doping on N-side - (Measured in 1 per Cubic Meter) - Doping on N-side refers to the process of introducing specific types of impurities into the N-type semiconductor region of a semiconductor device.
Doping on P-side - (Measured in 1 per Cubic Meter) - Doping On P-side refers to the process of introducing specific types of impurities into the P-type semiconductor region of a semiconductor device.
STEP 1: Convert Input(s) to Base Unit
Doping on N-side: 4.8 1 per Cubic Centimeter --> 4800000 1 per Cubic Meter (Check conversion ​here)
Doping on P-side: 1.8 1 per Cubic Centimeter --> 1800000 1 per Cubic Meter (Check conversion ​here)
STEP 2: Evaluate Formula
Substituting Input Values in Formula
γ = Ndn/(Ndn+Ndp) --> 4800000/(4800000+1800000)
Evaluating ... ...
γ = 0.727272727272727
STEP 3: Convert Result to Output's Unit
0.727272727272727 --> No Conversion Required
FINAL ANSWER
0.727272727272727 0.727273 <-- Emmitter Injection Efficiency
(Calculation completed in 00.004 seconds)

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19 Bipolar IC Fabrication Calculators

Resistance of Rectangular Parallelepiped
​ Go Resistance = ((Resistivity*Thickness of Layer)/(Width of Diffused Layer*Length of Diffused Layer))*(ln(Width of Bottom Rectangle/Length of Bottom Rectangle)/(Width of Bottom Rectangle-Length of Bottom Rectangle))
Impurity Atoms Per Unit Area
​ Go Total Impurity = Effective Diffusion*(Emitter Base Junction Area*((Charge*Intrinsic Concentration^2)/Collector Current)*exp(Voltage Base Emitter/Thermal Voltage))
Conductivity of N-Type
​ Go Ohmic Conductivity = Charge*(Electron Doping Silicon Mobility*Equilibrium Concentration of N-Type+Hole Doping Silicon Mobility*(Intrinsic Concentration^2/Equilibrium Concentration of N-Type))
Conductivity of P-Type
​ Go Ohmic Conductivity = Charge*(Electron Doping Silicon Mobility*(Intrinsic Concentration^2/Equilibrium Concentration of P-Type)+Hole Doping Silicon Mobility*Equilibrium Concentration of P-Type)
Ohmic Conductivity of Impurity
​ Go Ohmic Conductivity = Charge*(Electron Doping Silicon Mobility*Electron Concentration+Hole Doping Silicon Mobility*Hole Concentration)
Gate Source Capacitance Given Overlap Capacitance
​ Go Gate Source Capacitance = (2/3*Transistor's Width*Transistor's Length*Oxide Capacitance)+(Transistor's Width*Overlap Capacitance)
Collector-Current of PNP Transistor
​ Go Collector Current = (Charge*Emitter Base Junction Area*Equilibrium Concentration of N-Type*Diffusion Constant For PNP)/Base Width
Saturation Current in Transistor
​ Go Saturation Current = (Charge*Emitter Base Junction Area*Effective Diffusion*Intrinsic Concentration^2)/Total Impurity
Capacitive Load Power Consumption given Supply Voltage
​ Go Capacitive Load Power Consumption = Load Capacitance*Supply Voltage^2*Output Signal Frequency*Total Number of Outputs Switching
Sheet Resistance of Layer
​ Go Sheet Resistance = 1/(Charge*Electron Doping Silicon Mobility*Equilibrium Concentration of N-Type*Thickness of Layer)
Resistance of Diffused Layer
​ Go Resistance = (1/Ohmic Conductivity)*(Length of Diffused Layer/(Width of Diffused Layer*Thickness of Layer))
Current Density Hole
​ Go Hole Current Density = Charge*Diffusion Constant For PNP*(Hole Equilibrium Concentration/Base Width)
Impurity with Intrinsic Concentration
​ Go Intrinsic Concentration = sqrt((Electron Concentration*Hole Concentration)/Temperature Impurity)
Emitter Injection Efficiency
​ Go Emmitter Injection Efficiency = Emitter Current/(Emitter Current due to Electrons+Emitter Current due to Holes)
Breakout Voltage of Collector Emitter
​ Go Collector Emitter Breakout Voltage = Collector Base Breakout Voltage/(Current Gain of BJT)^(1/Root Number)
Emitter Injection Efficiency given Doping Constants
​ Go Emmitter Injection Efficiency = Doping on N-side/(Doping on N-side+Doping on P-side)
Current Flowing in Zener Diode
​ Go Diode Current = (Input Reference Voltage-Stable Output Voltage)/Zener Resistance
Voltage to Frequency Conversion Factor in ICs
​ Go Voltage to Frequency Conversion Factor in ICs = Output Signal Frequency/Input Voltage
Base Transport Factor given Base Width
​ Go Base Transport Factor = 1-(1/2*(Physical Width/Electron Diffusion Length)^2)

Emitter Injection Efficiency given Doping Constants Formula

Emmitter Injection Efficiency = Doping on N-side/(Doping on N-side+Doping on P-side)
γ = Ndn/(Ndn+Ndp)

How does doping affect the Figure of Merit in semiconductors?

Doping can influence the electrical and thermal properties of a semiconductor. Properly chosen doping concentrations can enhance the electrical conductivity.

How to Calculate Emitter Injection Efficiency given Doping Constants?

Emitter Injection Efficiency given Doping Constants calculator uses Emmitter Injection Efficiency = Doping on N-side/(Doping on N-side+Doping on P-side) to calculate the Emmitter Injection Efficiency, Emitter Injection Efficiency given Doping Constants formula is defined as measure of how efficiently a material converts heat into electricity (or vice versa) in thermoelectric applications. Emmitter Injection Efficiency is denoted by γ symbol.

How to calculate Emitter Injection Efficiency given Doping Constants using this online calculator? To use this online calculator for Emitter Injection Efficiency given Doping Constants, enter Doping on N-side (Ndn) & Doping on P-side (Ndp) and hit the calculate button. Here is how the Emitter Injection Efficiency given Doping Constants calculation can be explained with given input values -> 0.4 = 4.8/(4.8+1.8).

FAQ

What is Emitter Injection Efficiency given Doping Constants?
Emitter Injection Efficiency given Doping Constants formula is defined as measure of how efficiently a material converts heat into electricity (or vice versa) in thermoelectric applications and is represented as γ = Ndn/(Ndn+Ndp) or Emmitter Injection Efficiency = Doping on N-side/(Doping on N-side+Doping on P-side). Doping on N-side refers to the process of introducing specific types of impurities into the N-type semiconductor region of a semiconductor device & Doping On P-side refers to the process of introducing specific types of impurities into the P-type semiconductor region of a semiconductor device.
How to calculate Emitter Injection Efficiency given Doping Constants?
Emitter Injection Efficiency given Doping Constants formula is defined as measure of how efficiently a material converts heat into electricity (or vice versa) in thermoelectric applications is calculated using Emmitter Injection Efficiency = Doping on N-side/(Doping on N-side+Doping on P-side). To calculate Emitter Injection Efficiency given Doping Constants, you need Doping on N-side (Ndn) & Doping on P-side (Ndp). With our tool, you need to enter the respective value for Doping on N-side & Doping on P-side and hit the calculate button. You can also select the units (if any) for Input(s) and the Output as well.
How many ways are there to calculate Emmitter Injection Efficiency?
In this formula, Emmitter Injection Efficiency uses Doping on N-side & Doping on P-side. We can use 1 other way(s) to calculate the same, which is/are as follows -
  • Emmitter Injection Efficiency = Emitter Current/(Emitter Current due to Electrons+Emitter Current due to Holes)
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